Chemi-Mechanical Polishing of On-Axis Semi-Insulating SiC Substrates

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Periodical:

Materials Science Forum (Volumes 457-460)

Edited by:

Roland Madar, Jean Camassel and Elisabeth Blanquet

Pages:

805-808

DOI:

10.4028/www.scientific.net/MSF.457-460.805

Citation:

V.D. Heydemann et al., "Chemi-Mechanical Polishing of On-Axis Semi-Insulating SiC Substrates", Materials Science Forum, Vols. 457-460, pp. 805-808, 2004

Online since:

June 2004

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$35.00

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