Growth of Bulk SiC by Halide Chemical Vapor Deposition

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Periodical:

Materials Science Forum (Volumes 457-460)

Edited by:

Roland Madar, Jean Camassel and Elisabeth Blanquet

Pages:

87-90

DOI:

10.4028/www.scientific.net/MSF.457-460.87

Citation:

M. Fanton et al., "Growth of Bulk SiC by Halide Chemical Vapor Deposition", Materials Science Forum, Vols. 457-460, pp. 87-90, 2004

Online since:

June 2004

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$35.00

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