Growth of Bulk SiC by Halide Chemical Vapor Deposition

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Periodical:

Materials Science Forum (Volumes 457-460)

Edited by:

Roland Madar, Jean Camassel and Elisabeth Blanquet

Pages:

87-90

Citation:

M. Fanton et al., "Growth of Bulk SiC by Halide Chemical Vapor Deposition", Materials Science Forum, Vols. 457-460, pp. 87-90, 2004

Online since:

June 2004

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[1] D.L. Barrett, R.G. Seidenstricker, W. Gaida, R.H. Hopkins and W.J. Choyke: Journal of Crystal Growth Vol. 109 (1991), p.17.

[2] O. Kordina, C. Hallin, A. Ellison, A. Bakin, I. Ivanov, A. Henry, R. Yakimova, M. Touminem, A. Vehanen and E. Janzen: Applied Physics Letters Vol. 69 (1996), p.1456.

DOI: https://doi.org/10.1063/1.117613

[3] J.W. Milligan, J.R. Jenny, A.R. Powell, H. McD. Hobgood, A.A. Burk, S.T. Allen, A.W. Saxler, P.A. Parikh and J.W. Palmour: GOMACTech 20003 Proceedings, (2003), p.148.

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