Effect of NO Annealing on 6H- and 4H-SiC MOS Interface States

Article Preview

Abstract:

The electrical properties of the SiC/SiO2 interface resulting from oxidation of the n-type 6H-SiC polytype were studied by hi-lo CV, temperature dependent CV and constant capacitance deep level transient spectroscopy (CCDLTS) techniques. Several trap species differing in energy and capture cross section were identified. A trap distribution at 0.5 eV below the 6H-SiC conduction band energy and a shallower density of states in both the 6H and 4H polytyes are passivated by post-oxidation NO annealing. However, other ultra-shallow and deeper defect distributions remain after nitridation. The latter may originate from semiconductor traps.

You might also be interested in these eBooks

Info:

Periodical:

Materials Science Forum (Volumes 645-648)

Pages:

499-502

Citation:

Online since:

April 2010

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2010 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] R. Schoerner, et al.: IEEE Electron Dev. Lett. Vol. 20 (1999), p.241.

Google Scholar

[2] G.Y. Chung, et al.: IEEE Electron Dev. Lett. Vol. 22 (2001), p.176.

Google Scholar

[3] Y. Deng, et al.: J. Electron. Mater. Vol. 35 (2006), p.618.

Google Scholar

[4] S. Dhar, et al.: Appl. Phys. Lett. Vol. 92 (2008), p.102112.

Google Scholar

[5] S. Wang, et al.: Phys. Rev. Lett. Vol. 98 (2007), p.026101.

Google Scholar

[6] J. Rozen, et al.: J. Appl. Phys. Vol. 105 (2009), p.124506.

Google Scholar

[7] N.M. Johnson: J. Vac. Sci. Technol. Vol. 21 (1982), p.303.

Google Scholar

[8] M. Bassler and G. Pensl: Mat. Sci. Engin. B Vol. 61-62 (1999), p.490.

Google Scholar

[9] H.O. Olafsson, et al.: Mater. Sci. Forum Vol. 389-393 (2002), p.1005.

Google Scholar

[10] S. Potbhare, et al.: IEEE Trans. Electron Dev. Vol. 55 (2008), p. (2061).

Google Scholar

[11] V.V. Afanasev, et al.: Phys. Stat. Solidi (a) Vol. 162 (1997), p.321.

Google Scholar