High-Resolution Time-Resolved Carrier Lifetime and Photoluminescence Mapping of 4H-SiC Epilayers

Article Preview

Abstract:

We present a comparison between time-resolved carrier lifetime mappings of several samples and integrated near band edge intensity photoluminescence mappings using a pulsed laser. High-injection conditions and as-grown material are used, which generally allow for the assumption of a single exponential decay. The photoluminescence intensity under these circumstances is proportional to the carrier lifetime and the mappings can be used to detect lifetime-influencing defects in epilayers and give an estimate of the carrier lifetime variation over the wafer. Several examples for the defect detection capability of the system are given.

You might also be interested in these eBooks

Info:

Periodical:

Materials Science Forum (Volumes 717-720)

Pages:

293-296

Citation:

Online since:

May 2012

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2012 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] P. B. Klein, Carrier lifetime measurements in n-4H-SiC epilayers, J. Appl. Phys. 103 (2008) 033702-1-14.

Google Scholar

[2] J. Hassan and J. P. Bergman, Influence of structural defects on carrier lifetime in 4H-SiC epitaxial layers: Optical lifetime mapping, J. Appl. Phys. 105 (2009) 123518-1-5.

DOI: 10.1063/1.3147903

Google Scholar

[3] T. Kimoto, T. Hiyoshi, T. Hayashi and J. Suda, Impact of recombination at the surface and in the substrate on carrier lifetimes of n-type 4H-SiC epilayers, J. Appl. Phys. 108 (2010) 083721-1-7.

DOI: 10.1063/1.3498818

Google Scholar

[4] S. Ha, M. Skowronski, W. M. Vetter and M. Dudley, Basal plane slip and formation of mixed tilt boundaries in sublimation grown hexagonal polytype silicon carbide single crystals, J. Appl. Phys., 92 (2002) 778-785.

DOI: 10.1063/1.1484229

Google Scholar