p.297
p.301
p.305
p.309
p.313
p.319
p.323
p.327
p.331
Critical Conditions of Misfit Dislocation Formation in 4H-SiC Epilayers
Abstract:
Thermal annealing experiments were performed to determine the critical conditions of misfit dislocation formation in 4H-SiC epilayers in a temperature range of 1400-1800 °C. Misfit dislocations were observed to form at a given annealing temperature if the temperature gradient across the epi-wafer exceeded a critical value. It was also found that two types of interfacial dislocations could form under different stress conditions. Their formation mechanisms are discussed.
Info:
Periodical:
Pages:
313-318
Citation:
Online since:
May 2012
Authors:
Price:
Сopyright:
© 2012 Trans Tech Publications Ltd. All Rights Reserved
Share:
Citation: