Local Strain Distribution in AlN Thick Films Analyzed by X-Ray Microdiffraction

Dinh Thanh Khan; Shotaro Takeuchi; Yoshiaki Nakamura; Hideto Miyake; Kazumasa Hiramatsu; Yoshihiko Imai; Shigeru Kimura; Akira Sakai

doi:10.4028/www.scientific.net/MSF.783-786.2016

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HomeMaterials Science ForumMaterials Science Forum Vols. 783-786Local Strain Distribution in AlN Thick Films...

Local Strain Distribution in AlN Thick Films Analyzed by X-Ray Microdiffraction

Abstract:

We investigated local strain distribution in a cross-sectional area throughout the thickness of a thick aluminum nitride (AlN) film epitaxially grown on a trench-patterned AlN/α-Al₂O₃ template using X-ray microdiffraction measurements for AlN and Bragg reflections. The results show that the presence of voids caused by the trench pattern strongly influences on the distribution of the strain components in the and directions, which are perpendicular to the trench lines. Discrepancy between strain values obtained from the two Bragg reflections was shown to be the result of twisting of the crystal domains about the axis in the thick AlN film.

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Materials Science Forum (Volumes 783-786)

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2016-2021

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https://doi.org/10.4028/www.scientific.net/MSF.783-786.2016

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May 2014

Authors:

Dinh Thanh Khan, Shotaro Takeuchi, Yoshiaki Nakamura, Hideto Miyake, Kazumasa Hiramatsu, Yoshihiko Imai, Shigeru Kimura, Akira Sakai

Keywords:

Aluminum Nitride (AlN), Crystal Domain, Strain, Trench-Patterned Template, Twisting, X-Ray Microdiffraction

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