[1]
T. Ujihara, S. Munetoh, K. Kusunoki, N. Usami, K. Fujiwara, G. Sazaki, K. Nakajima, Crystal quality of a 6H-SiC layer grown over macrodefects by liquid-phase epitaxy: a Raman spectroscopic study, Thin Solid Films, 476 (2005) 206-209.
DOI: 10.1016/j.tsf.2004.09.039
Google Scholar
[2]
Y. Yamamoto, S. Harada, K. Seki, A. Horio, T. Mitsuhashi, T. Ujihara, High-efficiency conversion of threading screw dislocations in 4H-SiC by Solution Growth, Appl. Phys. Express, 5 (2012) 115501.
DOI: 10.1143/apex.5.115501
Google Scholar
[3]
Y. Yamamoto, S. Harada, K. Seki, A. Horio, T. Mitsuhashi, D. Koike, M. Tagawa, T. Ujihara, Low-dislocation-density 4H-SiC crystal growth utilizing dislocation conversion during solution method, Appl. Phys. Express, 7 (2014) 065501.
DOI: 10.7567/apex.7.065501
Google Scholar
[4]
K. Kusunoki, N. Okada, K. Kamei, K. Moriguchi, H. Daikoku, M. Kado, H. Sakamoto, T. Bessho, T. Ujihara, Top-seeded solution growth of three-inch-diameter 4H-SiC using convection control technique, J. Cryst. Growth, 395 (2014) 68-73.
DOI: 10.1016/j.jcrysgro.2014.03.006
Google Scholar
[5]
Information on http: / http: /www. openfoam. com.
Google Scholar
[6]
J. Lefebure, J. M. Dedulle, T. Ouisse, D. Chaussende, Modeling of the growth rate during top seeded solution growth of SiC using pure silicon as a solvent, Cryst. Growth Des., 12 (2012) 909-913.
DOI: 10.1021/cg201343w
Google Scholar
[7]
F. Mercier, J. M. Dedulle, D. Chaussende, M. Pons, Coupled heat transfer and fluid dynamics modeling of high-temperature SiC solution growth, J. Cryst. Growth, 312 (2010) 155-163.
DOI: 10.1016/j.jcrysgro.2009.10.007
Google Scholar
[8]
F. Mercier, S. Nishizawa, Numerical investigation of the growth rate enhancement of SiC crystal growth from silicon melts, Jpn. J. Appl. Phys., 50 (2011) 035603.
DOI: 10.1143/jjap.50.035603
Google Scholar
[9]
F. Durand, J. C. Duby, Carbon solubility in solid and liquid silicon—a review with reference to eutectic equilibrium, J. Phase Equilib. 20 (1999) 61-63.
DOI: 10.1361/105497199770335956
Google Scholar