Temperature Dependency of Silicon Carbide MOSFET On-Resistance Characterization and Modeling

Article Preview

Abstract:

Silicon carbide (SiC) MOSFET features low on-resistance per area even at high temperatures compared to a silicon (Si) counterpart with the same voltage rating. However, SiC MOSFET exhibits a unique behavior over operating temperatures due to the presence of interface trap charges. The effect of temperature on the on-resistance of SiC MOSFET has been studied through experimental measurements at difference temperatures from - 30 °C to 150 °C. The results show that high contribution of channel resistance is the critical factor to determine the behavior of SiC MOSFET with temperature.

You might also be interested in these eBooks

Info:

Periodical:

Pages:

592-595

Citation:

Online since:

July 2019

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2019 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

* - Corresponding Author

[1] B. J. Baliga, Advanced Power MOSFET Concepts, first ed., Springer US, (2010).

Google Scholar

[2] M. Shen and S. Krishnamurthy, Simplified loss analysis for high speed SiC MOSFET inverter, IEEE Applied Power Electronics Conference and Exposition (APEC), (2012) 1682-1687.

DOI: 10.1109/apec.2012.6166047

Google Scholar

[3] T. Lopez and R. Elferich, Static paralleling of power MOSFETs in thermal equilibrium, IEEE Applied Power Electronics Conference and Exposition (APEC), (2006).

DOI: 10.1109/apec.2006.1620637

Google Scholar

[4] Y. Avenas, L. Dupont, and Z. Khatir, Temperature measurement of power semiconductor devices by thermo-sensitive electrical parameters - A Review, IEEE Trans on Pow Elect, 27 (2012).

DOI: 10.1109/tpel.2011.2178433

Google Scholar

[5] D. L. Dang, S. Guichard, M. Urbain and S. Raël, Characterization and analytical modeling of 4H-SiC VDMOSFET in the forward operation, IEEE European Conference on Power Electronics and Applications (EPE'16 ECCE Europe), (2016) 1-10.

DOI: 10.1109/epe.2016.7695604

Google Scholar

[6] S. Dhar, et al, Inversion layer carrier concentration and mobility in 4H–SiC metal-oxide-semiconductor field-effect transistors J. Appl. Phys 108, (2010). 054509.

DOI: 10.1063/1.3484043

Google Scholar

[7] G. Y. Chung, et al, Improved inversion channel mobility for 4H-SiC MOSFETs following high temperature anneals in nitric oxide, IEEE Elect Dev Letters. vol. 22, (2001) 176-178.

DOI: 10.1109/55.915604

Google Scholar

[8] J. A. Cooper and T. Kimoto, Fundamentals of Silicon Carbide Technology: Growth, Characterization, Devices and Applications, Wiley-IEEE Press, Singapore, (2014).

Google Scholar