Etch Rate Depth Profiling by Single Wafer Etching Equipment

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Periodical:

Solid State Phenomena (Volumes 103-104)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

107-110

Citation:

E. Bellandi et al., "Etch Rate Depth Profiling by Single Wafer Etching Equipment", Solid State Phenomena, Vols. 103-104, pp. 107-110, 2005

Online since:

April 2005

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Price:

$38.00

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