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HomeSolid State PhenomenaSolid State Phenomena Vols. 103-104HF Based Solutions for HfO2 Removal; Effect of pH...

HF Based Solutions for HfO₂ Removal; Effect of pH and Temperature on HfO₂: SiO₂ Etch Selectivity

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Solid State Phenomena (Volumes 103-104)

Pages:

97-102

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.103-104.97

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Online since:

April 2005

Authors:

Vasile Paraschiv, Martine Claes, Mikhail R. Baklanov, Werner Boullart, Stefan De Gendt, Serge Vanhaelemeersch

Keywords:

HF, HfO₂, High-k, Wet-Removal

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© 2005 Trans Tech Publications Ltd. All Rights Reserved

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DOI: 10.4028/www.scientific.net/ssp.92.11

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