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HomeSolid State PhenomenaSolid State Phenomena Vols. 103-104Etching of Silicon Oxide Films in Supercritical...

Etching of Silicon Oxide Films in Supercritical Carbon Dioxide

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Periodical:

Solid State Phenomena (Volumes 103-104)

Pages:

115-120

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.103-104.115

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Online since:

April 2005

Authors:

Koichiro Saga, Hitoshi Kuniyasu, Takeshi Hattori, Kenji Yamada, Tomoyuki Azuma

Keywords:

Etching, Micro-Electromechanical System (MEMS), Silicon Dioxide, Supercritical CO₂

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© 2005 Trans Tech Publications Ltd. All Rights Reserved

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