Analyzing the Collapse Force of Narrow Lines Measured by Lateral Force AFM Using an Analytical Mechanical Model

Abstract:

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When a physical cleaning technology, such as megasonic and high-velocity-liquid aerosol cleaning, is considered for the removal of particles or photo resist residues, damage addition is a major concern. After detection of defects in long gate stack lines by bright field inspection (KT2800), SEM imaging shows they extend over a length in the order of 1μm (Figure 1) [1].

Info:

Periodical:

Solid State Phenomena (Volumes 145-146)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

55-58

DOI:

10.4028/www.scientific.net/SSP.145-146.55

Citation:

K. Wostyn et al., "Analyzing the Collapse Force of Narrow Lines Measured by Lateral Force AFM Using an Analytical Mechanical Model", Solid State Phenomena, Vols. 145-146, pp. 55-58, 2009

Online since:

January 2009

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Price:

$35.00

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