Analyzing the Collapse Force of Narrow Lines Measured by Lateral Force AFM Using an Analytical Mechanical Model

Kurt Wostyn; Tae Gon Kim; Paul W. Mertens; Jin Goo Park

doi:10.4028/www.scientific.net/SSP.145-146.55

Paper Titles

High Velocity Aerosol Cleaning with Organic Solvents: Particle Removal and Substrate Damage
p.39

Cleaning Technique Using High-Speed Steam-Water Mixed Spray
p.43

Pattern Collapse and Particle Removal Forces of Interest to Semiconductor Fabrication Process
p.47

Applications of Electrostatic Spray Techniques to Surface Cleaning
p.51

Analyzing the Collapse Force of Narrow Lines Measured by Lateral Force AFM Using an Analytical Mechanical Model
p.55

Reduced Particle Removal Efficiency Upon Wafer Storage
p.61

Local Distribution of Particles Deposited on Patterned Surfaces
p.65

Particle Retention Mechanism of Filter in High Temperature Chemical
p.69

Improving Process Control for Copper Electroplating through Filter Membrane Optimization
p.73

HomeSolid State PhenomenaSolid State Phenomena Vols. 145-146Analyzing the Collapse Force of Narrow Lines...

Analyzing the Collapse Force of Narrow Lines Measured by Lateral Force AFM Using an Analytical Mechanical Model

Abstract:

When a physical cleaning technology, such as megasonic and high-velocity-liquid aerosol cleaning, is considered for the removal of particles or photo resist residues, damage addition is a major concern. After detection of defects in long gate stack lines by bright field inspection (KT2800), SEM imaging shows they extend over a length in the order of 1μm (Figure 1) [1].