Study of Oxygen Concentration in TMAH Solution for Improvement of Sigma-Shaped Wet Etching Process

Yong Gen He; Huan Xin Liu; Jia Lei Liu; Jin Gang Wu; Christian Haigermoser; Feng Liu; Mei Sheng Zhou; Wei Lu

doi:10.4028/www.scientific.net/SSP.255.18

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Study of Oxygen Concentration in TMAH Solution for Improvement of Sigma-Shaped Wet Etching Process
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HomeSolid State PhenomenaSolid State Phenomena Vol. 255Study of Oxygen Concentration in TMAH Solution for...

Study of Oxygen Concentration in TMAH Solution for Improvement of Sigma-Shaped Wet Etching Process

Abstract:

Tetramethylammonium hydroxide (TMAH) is a common etchant for Sigma shape formation in IC manufacturing. The impact of oxygen dissolved in TMAH solution on process was studied in this paper. A novel O2 gas injector was developed to improve the process stabilization by control of the oxygen concentration in TMAH solution

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Periodical:

Solid State Phenomena (Volume 255)

Pages:

18-21

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.255.18

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Online since:

September 2016

Authors:

Yong Gen He*, Huan Xin Liu, Jia Lei Liu, Jin Gang Wu, Christian Haigermoser, Feng Liu, Mei Sheng Zhou, Wei Lu

Keywords:

Oxygen, Sigma Wet Etching, TMAH

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* - Corresponding Author

References

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DOI: 10.4028/www.scientific.net/ssp.219.78

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DOI: 10.1149/1.2086278

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