For Libraries For Publication Open Access Downloads About Us Contact Us
Paper Titles
Preface
Industry Context for Semiconductor Wet Etch and Surface Preparation
p.3
Surface Recombination Velocity Imaging of HF-Etched Si Wafers Using Dynamic Heterodyne Lock-In Carrierography
p.13
Organic Material Removal by Thermally Activated Ozone Gas
p.19
Carbon Removal and Native Oxide Cleaning on Si and SiGe Surfaces in Previum Chamber
p.25
Vapor-Phase Deposition of N3-Containing Monolayers on SiO2 and Si3N4 for Wafer Scale Biofunctionalization
p.31
Toward the Surface Preparation of InGaAs for the Future CMOS Integration
p.39
Effect of WET treatment on Group III-V Compound Semiconductor Surface
p.43
Nanoscale Etching of GaAs and InP in Acidic H2O2 Solution: A Striking Contrast in Kinetics and Surface Chemistry
p.48

Preface

Article Preview

Abstract:

By email View Pdf
You might also be interested in these eBooks
Ultra Clean Processing of Semiconductor Surfaces XIV View Preview

Info:

Periodical:

Solid State Phenomena (Volume 282)

Online since:

August 2018

Сopyright:

© 2018 Trans Tech Publications Ltd. All Rights Reserved

Share:

© 2025 Trans Tech Publications Ltd. All rights are reserved, including those for text and data mining, AI training, and similar technologies. For open access content, terms of the Creative Commons licensing CC-BY are applied.
Scientific.Net is a registered trademark of Trans Tech Publications Ltd.