Vapor-Phase Deposition of N3-Containing Monolayers on SiO2 and Si3N4 for Wafer Scale Biofunctionalization

Rita Vos; Tim Steylaerts; Alexis Franquet; Alain Moussa; Tim Stakenborg; Karolien Jans

doi:10.4028/www.scientific.net/SSP.282.31

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Vapor-Phase Deposition of N₃-Containing Monolayers on SiO₂ and Si₃N₄ for Wafer Scale Biofunctionalization
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HomeSolid State PhenomenaSolid State Phenomena Vol. 282Vapor-Phase Deposition of N3-Containing Monolayers...

Vapor-Phase Deposition of N₃-Containing Monolayers on SiO₂ and Si₃N₄ for Wafer Scale Biofunctionalization

Abstract:

The vapor-phase deposition of 11-azidoundecyltrimethoxysilanes at reduced pressure and elevated temperature allows the introduction of azido (N₃) functionalized silicon wafer substrates. This process can be optimized by controlling the amount of surface adsorbed water and results in uniform and reproducible self-assembled monolayers (SAMs). The N₃-SAM density as investigated via TOF-SIMS is comparable on thermal oxide and Si₃N₄ substrates. Furthermore, it is demonstrated that biomolecules can be successfully conjugated on both substrates using azide-alkyne ‘click’ reactions.

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Periodical:

Solid State Phenomena (Volume 282)

Pages:

31-36

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.282.31

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Online since:

August 2018

Authors:

Rita Vos*, Tim Steylaerts, Alexis Franquet, Alain Moussa, Tim Stakenborg, Karolien Jans

Keywords:

Bioconjugation, Biointerface, Biosensor Fabrication, Click Reaction, Self-Assembled Monolayers, Vapor-Phase Silanization

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