Normally-Off 1200V Silicon Carbide JFET Diode with Low VF

Article Preview

Abstract:

Novel diode structure which looks like DMOSFETs with the gate-shorted to n+ source has been developed for the first time. The lateral JFET channel as a built-in channel instead of gate oxide is integrated and it is pinched-off under the zero bias condition. As JFET diode decreases the forward voltage drop using JFET channel efficiency rather than the cell pitch reduction or the increase of doping concentration in n-SiC drift region, VF and capacitive charges which have a trade-off relationship typically could be decreased simultaneously and a better switching performance is also expected accordingly. Figure-of-Merit (=VF×QC) of the proposed JFET diode has been improved by 20.2% in average compared to that of JBS diode and this FOM would be the best in class among 1200V SiC diode products.

You might also be interested in these eBooks

Info:

* - Corresponding Author

[1] Shigeharu Yamagami, Tetsuya Hayashi, and Masakatsu Hoshi, Materials Science Forum vol. 717-720 (2012) pp.1005-1008.

Google Scholar

[2] Wensuo Chen, Peijian Zhang, Y. Zhong, K. Tan, R. Liao, Zheng Zeng, and Bo Zhang, IEEE Electron Device Letters, vol. 38, No. 2, Feb. 2017.

Google Scholar

[3] S. Lotfi, L.G. Li, Ö. Vallin, L. Vestling, H. Norström, J. Olsson, Solid-State Electronics 70 (2012) pp.14-19.

DOI: 10.1016/j.sse.2011.11.019

Google Scholar