Low-Temperature Doping of P-Type Czochralski Silicon due to Hydrogen Plasma Enhanced Thermal Donor Formation

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Periodical:

Solid State Phenomena (Volumes 57-58)

Edited by:

C. Claeys, J. Vanhellemont, H. Richter and M. Kittler

Pages:

189-196

DOI:

10.4028/www.scientific.net/SSP.57-58.189

Citation:

A. G. Ulyashin et al., "Low-Temperature Doping of P-Type Czochralski Silicon due to Hydrogen Plasma Enhanced Thermal Donor Formation", Solid State Phenomena, Vols. 57-58, pp. 189-196, 1997

Online since:

July 1997

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