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HomeSolid State PhenomenaSolid State Phenomena Vols. 65-66A Process Using Ozonated Water Solutions to Remove...

A Process Using Ozonated Water Solutions to Remove Photoresist after Metallization

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Ultra Clean Processing of Silicon Surfaces IV

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Periodical:

Solid State Phenomena (Volumes 65-66)

Pages:

287-290

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.65-66.287

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Online since:

November 1998

Authors:

S.L. Nelson, L.E. Carter

Keywords:

Aluminum (Al), Ozone, Photoresist Strip

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© 1999 Trans Tech Publications Ltd. All Rights Reserved

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