A Process Using Ozonated Water Solutions to Remove Photoresist after Metallization

Abstract:

Article Preview

Info:

Periodical:

Solid State Phenomena (Volumes 65-66)

Edited by:

Marc Heyns, Marc Meuris and Paul Mertens

Pages:

287-290

DOI:

10.4028/www.scientific.net/SSP.65-66.287

Citation:

S.L. Nelson and L.E. Carter, "A Process Using Ozonated Water Solutions to Remove Photoresist after Metallization", Solid State Phenomena, Vols. 65-66, pp. 287-290, 1999

Online since:

November 1998

Export:

Price:

$35.00

In order to see related information, you need to Login.