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HomeSolid State PhenomenaSolid State Phenomena Vols. 65-66Characterization of HF Cleaning of Ion-Implanted...

Characterization of HF Cleaning of Ion-Implanted Si Surfaces

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Ultra Clean Processing of Silicon Surfaces IV

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Periodical:

Solid State Phenomena (Volumes 65-66)

Pages:

271-274

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.65-66.271

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Online since:

November 1998

Authors:

E. Kondoh, Mikhail R. Baklanov, Karen Maex

Keywords:

HF Cleaning, Implantation, Silicon

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© 1999 Trans Tech Publications Ltd. All Rights Reserved

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