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Detection and Identification of Organic Contamination on Silicon Substrates
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Preparation and Characterization of Time Dependent Haze on Silicon Surfaces
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Single Chemistry Cleaning Solution for Advanced Wafer Cleaning
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Behaviors of Metallic Contaminants in Si Wafer Processing
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Iron Bulk Concentration Effect on the Yield & Reliability of Thin Oxides
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Gap States at the Interface of Ultra-Thin Oxide and Organic Films on Si(100)
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Modification of Low-K SiCOH Film Porosity by a HF Solution
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Layer-By-Layer Oxidation of Silicon
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HomeSolid State PhenomenaSolid State Phenomena Vols. 76-77Behaviors of Metallic Contaminants in Si Wafer...

Behaviors of Metallic Contaminants in Si Wafer Processing

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Ultra Clean Processing of Silicon Surfaces V

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Periodical:

Solid State Phenomena (Volumes 76-77)

Pages:

123-126

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.76-77.123

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Online since:

January 2001

Authors:

Joong S. Jeon, Stefan De Gendt, Srini Raghavan, Marcia Almanza-Workman, Cynthia Gonsalves, Bob Ogle

Keywords:

Co, Contamination, Fe, Lifetime, Metal, Nickel Ni, Oxide, Titanium (Ti)

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© 2001 Trans Tech Publications Ltd. All Rights Reserved

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