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Iron Bulk Concentration Effect on the Yield & Reliability of Thin Oxides
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Gap States at the Interface of Ultra-Thin Oxide and Organic Films on Si(100)
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HomeSolid State PhenomenaSolid State Phenomena Vols. 76-77Iron Bulk Concentration Effect on the Yield &...

Iron Bulk Concentration Effect on the Yield & Reliability of Thin Oxides

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Ultra Clean Processing of Silicon Surfaces V

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Periodical:

Solid State Phenomena (Volumes 76-77)

Pages:

127-130

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.76-77.127

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Online since:

January 2001

Authors:

Kah Keen Lai, Chee Kong Leong, Hwee Ling Yeo

Keywords:

I_dd (Off-State Standby Current, J Factor (Current Density in A/cm²), Q_bd (Charge to Breakdown)

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© 2001 Trans Tech Publications Ltd. All Rights Reserved

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