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HomeSolid State PhenomenaSolid State Phenomena Vols. 76-77Modification of Low-K SiCOH Film Porosity by a HF...

Modification of Low-K SiCOH Film Porosity by a HF Solution

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Abstract:

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Ultra Clean Processing of Silicon Surfaces V

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Periodical:

Solid State Phenomena (Volumes 76-77)

Pages:

135-138

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.76-77.135

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Online since:

January 2001

Authors:

Denis Shamiryan, Mikhail R. Baklanov, Guy Vereecke, Serge Vanhaelemeersch, Karen Maex

Keywords:

Low-K Material, Porosity

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© 2001 Trans Tech Publications Ltd. All Rights Reserved

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