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Gap States at the Interface of Ultra-Thin Oxide and Organic Films on Si(100)
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Modification of Low-K SiCOH Film Porosity by a HF Solution
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Layer-By-Layer Oxidation of Silicon
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The Evolution of Chemical Oxides Into Ultrathin Oxides: A Spectroscopic Characterization
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Influence of Boron and Fluorine Incorporation on the Network Structure of Ultrathin SiO₂
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The Origins of Fluorine in Dry Ultrathin Silicon Oxides
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Structural and Electrical Characterization of Ultra-Thin SiO₂ Films Prepared by Catalytic Oxidation Method
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HomeSolid State PhenomenaSolid State Phenomena Vols. 76-77Layer-By-Layer Oxidation of Silicon

Layer-By-Layer Oxidation of Silicon

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Ultra Clean Processing of Silicon Surfaces V

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Periodical:

Solid State Phenomena (Volumes 76-77)

Pages:

139-144

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.76-77.139

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Online since:

January 2001

Authors:

Takeshi Hattori, Kazuhiko Takahashi, H. Nohira, Tadahiro Ohmi

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© 2001 Trans Tech Publications Ltd. All Rights Reserved

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