Paper Titles

Layer-By-Layer Oxidation of Silicon
p.139

The Evolution of Chemical Oxides Into Ultrathin Oxides: A Spectroscopic Characterization
p.145

Influence of Boron and Fluorine Incorporation on the Network Structure of Ultrathin SiO₂
p.149

The Origins of Fluorine in Dry Ultrathin Silicon Oxides
p.153

Structural and Electrical Characterization of Ultra-Thin SiO₂ Films Prepared by Catalytic Oxidation Method
p.157

Characterization of DI Water/O₃ Oxidation of Si (100) and Si (111) Surfaces by OCP Measurements
p.161

Effect of Chemical Oxides Formed During Pre-Gate Oxide Cleaning on the Properties of Sub 20Ǻ Thick Ultra-Thin Stack Gate Dielectrics
p.165

Controlling Silicon Surface Roughness During Photochemical Cleaning
p.169

Influence of Cleaning on the Quality of the Bonding Interface in Direct Bonded Silicon Wafers
p.173

HomeSolid State PhenomenaSolid State Phenomena Vols. 76-77Structural and Electrical Characterization of...

Structural and Electrical Characterization of Ultra-Thin SiO₂ Films Prepared by Catalytic Oxidation Method

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Ultra Clean Processing of Silicon Surfaces V

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Periodical:

Solid State Phenomena (Volumes 76-77)

Pages:

157-160

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.76-77.157

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Online since:

January 2001

Authors:

Akira Izumi, Manabu Kudo, Hideki Matsumura

Keywords:

Low-Temperature, Oxidation, Ultra Thin SiO₂

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© 2001 Trans Tech Publications Ltd. All Rights Reserved

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