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Controlling Silicon Surface Roughness During Photochemical Cleaning
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Characterization and Production Metrology of Thin Transistor Gate Dielectric Films
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Electronic Properties of Wet-Chemically Prepared Oxide Layers
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A Probe of Chemical Oxide Growth Conditions
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Fundamentals of Wafer Rinse Processes and the Interactions with Water Conservation and Recycling in Semiconductor Manufacturing Plants
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A Novel Rinsing Tank Concept to Save DI Water Using an Internal Recirculation Flow: 'Circle Stream Rinser'
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HomeSolid State PhenomenaSolid State Phenomena Vols. 76-77A Probe of Chemical Oxide Growth Conditions

A Probe of Chemical Oxide Growth Conditions

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Ultra Clean Processing of Silicon Surfaces V

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Periodical:

Solid State Phenomena (Volumes 76-77)

Pages:

185-188

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.76-77.185

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Online since:

January 2001

Authors:

Larry W. Shive, Claire Frey, Carissima Vitus

Keywords:

Photo-Thermal Reflection Spectroscopy, Silicon Dioxide, Stress

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© 2001 Trans Tech Publications Ltd. All Rights Reserved

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