Supercritical Carbon Dioxide Processing of Porous Methylsilsesquioxane(PMSQ) Low-k Dielectric Films

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Periodical:

Solid State Phenomena (Volume 92)

Edited by:

Marc Heyns, Paul Mertens and Marc Meuris

Pages:

293-296

DOI:

10.4028/www.scientific.net/SSP.92.293

Citation:

H. J. Martinez et al., "Supercritical Carbon Dioxide Processing of Porous Methylsilsesquioxane(PMSQ) Low-k Dielectric Films", Solid State Phenomena, Vol. 92, pp. 293-296, 2003

Online since:

May 2003

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$35.00

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