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New Dry Tool after Cleaning of Low-k Dielectrics
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Supercritical Carbon Dioxide Processing of Porous Methylsilsesquioxane(PMSQ) Low-k Dielectric Films
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Supercritical Carbon Dioxide Processing of Porous Methylsilsesquioxane(PMSQ) Low-k Dielectric Films

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Periodical:

Solid State Phenomena (Volume 92)

Pages:

293-296

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.92.293

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Online since:

May 2003

Authors:

Hunter John Martinez, Thieu Jacobs, Josh Wolf, Laura Rothman

Keywords:

Porous Methylsilsesquioxane-pMSQ, Supercritical Carbon Dioxide

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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