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HomeMaterials Science ForumMaterials Science Forum Vols. 185-188Effect of Structure of Hydrogenated SiNx:H Films...

Effect of Structure of Hydrogenated SiN_x:H Films on the Dissociation Mechanism of Si-H and N-H Bonds

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Passivation of Metals and Semiconductors

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Periodical:

Materials Science Forum (Volumes 185-188)

Pages:

119-128

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.185-188.119

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Online since:

March 1995

Authors:

E.B. Gorokhov, A.G. Noskov, V.V. Vasilyev, E.M. Trukhan, V.N. Ovsyuk, G.Yu. Salieva

Keywords:

Chemically Bonded Hydrogen, Film Shrinkage, Glassy Films, Network Reconstruction, Stress, Viscosity

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© 1995 Trans Tech Publications Ltd. All Rights Reserved

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