Characteristics of Si-SiO2 Systems Obtained by Thermal Oxidation of Silicon Surface Covered with Silicon-Hydrogen Layers

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Periodical:

Materials Science Forum (Volumes 185-188)

Edited by:

K.E. Heusler

Pages:

105-108

DOI:

10.4028/www.scientific.net/MSF.185-188.105

Citation:

V.Y. Uritsky and B.B. Loginov, "Characteristics of Si-SiO2 Systems Obtained by Thermal Oxidation of Silicon Surface Covered with Silicon-Hydrogen Layers", Materials Science Forum, Vols. 185-188, pp. 105-108, 1995

Online since:

March 1995

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