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Effect of Substrate Bias on 3C-SiC Deposition on Si by AC Plasma-Assisted CVD
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Mechanisms of SiC Formation in the Ion Beam Synthesis of 3C-SiC Layers in Silicon
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Formation and Prevention of Micropipes and Voids in CVD Carbonization Experiments on (100) Silicon
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Fabrication of 3C-SiC on SiO₂ Structures Using Wafer Bonding Techniques
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Growth Mode and Kinetics of Atmospheric Pressure Chemical Vapour Deposition of β-SiC on Si(100) Substrate
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Germanium as a Possible Surfactant for Growth of Beta Silicon Carbide on Silicon Substrates
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HomeMaterials Science ForumMaterials Science Forum Vols. 264-268Formation and Prevention of Micropipes and Voids...

Formation and Prevention of Micropipes and Voids in CVD Carbonization Experiments on (100) Silicon

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Periodical:

Materials Science Forum (Volumes 264-268)

Pages:

219-222

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.264-268.219

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Online since:

February 1998

Authors:

R. Scholz, U.M. Gösele, Frank Wischmeyer, E. Niemann

Keywords:

Carbonization of Silicon, Electron Microscopy, Interface Defects, Micropipe, Void

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© 1998 Trans Tech Publications Ltd. All Rights Reserved

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