Effect of Substrate Bias on 3C-SiC Deposition on Si by AC Plasma-Assisted CVD

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Periodical:

Materials Science Forum (Volumes 264-268)

Edited by:

G. Pensl, H. Morkoç, B. Monemar and E. Janzén

Pages:

211-214

DOI:

10.4028/www.scientific.net/MSF.264-268.211

Citation:

H. Shimizu and M. Shiga, "Effect of Substrate Bias on 3C-SiC Deposition on Si by AC Plasma-Assisted CVD", Materials Science Forum, Vols. 264-268, pp. 211-214, 1998

Online since:

February 1998

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$35.00

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