A Non-Destructive Technique for High Field Characterization of Gate Insulators in SiC MOS Capacitors

Article Preview

Abstract:

You might also be interested in these eBooks

Info:

Periodical:

Materials Science Forum (Volumes 264-268)

Pages:

665-668

Citation:

Online since:

February 1998

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 1998 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation: