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HomeMaterials Science ForumMaterials Science Forum Vols. 338-342Demonstration of Deep (80μm) RIE Etching of SiC...

Demonstration of Deep (80μm) RIE Etching of SiC for MEMS and MMIC Applications

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Silicon Carbide and Related Materials - 1999

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Periodical:

Materials Science Forum (Volumes 338-342)

Pages:

1053-1056

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.338-342.1053

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Online since:

May 2000

Authors:

David C. Sheridan, Jeff B. Casady, C.E. Ellis, R.R. Siergiej, J.D. Cressler, R.M. Strong, W.M. Urban, W.F. Valek, C.F. Seiler, H. Buhay

Keywords:

Etching, Isolation, Masking, Micro-Electromechanical System (MEMS), RIE

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© 2000 Trans Tech Publications Ltd. All Rights Reserved

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