[1]
J. Tan, J. A. Cooper, Jr., and M. R. Melloch, IEEE Electron Device Lett, 19 (1998) 487.
Google Scholar
[2]
K. Malhan, Int. Workshop on Ultra-Low-Loss Power Device Tech. Nara, (2000).
Google Scholar
[3]
O. Kusumoto, T. Yokogawa, K. Yamashita, T. Takahashi, M. Kitabatake, M. Uchida, and R. Miyanaga, Mat. Sci. Forum, 389-393 (2002) 1211.
DOI: 10.4028/www.scientific.net/msf.389-393.1211
Google Scholar
[4]
M. Imaizumi, Y. Tarui, H. Sugimoto, K. Ohtsuka, T. Takami, and T. Ozeki, Mat. Sci. Forum, 389-393 (2002) 1203.
DOI: 10.4028/www.scientific.net/msf.389-393.1203
Google Scholar
[5]
T. Kimoto, S. Nakazawa, K. Fujihira, T. Hirao, S. Nakamura, Y. Chen, K. Hashimoto and H. Matsunami, Mat. Sci. Forum, 389-393 (2002) 165.
DOI: 10.4028/www.scientific.net/msf.389-393.165
Google Scholar
[6]
T. Hatakeyama, T. Watanebe, S. Imai and T. Shinohe, presented in this conference. Fig. 4. Cross-sectional view and measured blocking characteristics of fabricated channel doped MOSFET.
Google Scholar