Diluted Nitric Oxide (NO) Annealing of SiO2/4H-SiC in Cold-Wall Oxidation Furnace

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Periodical:

Materials Science Forum (Volumes 457-460)

Edited by:

Roland Madar, Jean Camassel and Elisabeth Blanquet

Pages:

1345-1348

DOI:

10.4028/www.scientific.net/MSF.457-460.1345

Citation:

R. Kosugi and K. Fukuda, "Diluted Nitric Oxide (NO) Annealing of SiO2/4H-SiC in Cold-Wall Oxidation Furnace", Materials Science Forum, Vols. 457-460, pp. 1345-1348, 2004

Online since:

June 2004

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