Effects of Thermal Treatments on the Structural and Electrical Properties of Ni/Ti Bilayers Schottky Contacts on 6H-SiC

Fabrizio Roccaforte; Francesco La Via; A. Baeri; Vito Raineri; Lucia Calcagno; F. Mangano

doi:10.4028/www.scientific.net/MSF.457-460.865

Paper Titles

In-Situ Investigation of Carbon Reduction at Ni/4H-SiC Interface Using a Silicon Interlayer
p.849

The Formation of Low Resistance Ohmic Contacts to 4H-SiC, Circumventing the Need for Post Annealing, Studied by Specific Contact Resistance Measurements and X-Ray Photoelectron Spectroscopy
p.853

The Basic Parameters of Diffusion Welded Al Schottky Contacts to p- and n-SiC
p.857

Schottky-Ohmic Transition in Nickel Silicide/SiC-4H System: the Effect of Non Uniform Schottky Barrier
p.861

Effects of Thermal Treatments on the Structural and Electrical Properties of Ni/Ti Bilayers Schottky Contacts on 6H-SiC
p.865

Electrical Characterization of Inhomogeneous Ni₂/Si/SiC Schottky Contacts
p.869

Study of TiW/Au Thin Films Metallization Stack for High Temperature and Harsh Environment Devices on 6H Silicon Carbide
p.873

High Temperature and High Power Stability Investigation of Al-Based Ohmic Contacts to p-Type 4H-SiC
p.877

Contact Resistivity and Barrier Height of Al/Ti Ohmic Contacts on p-Type Ion Implanted 4H- and 6H-SiC
p.881

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Effects of Thermal Treatments on the Structural and Electrical Properties of Ni/Ti Bilayers Schottky Contacts on 6H-SiC

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Materials Science Forum (Volumes 457-460)

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865-868

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https://doi.org/10.4028/www.scientific.net/MSF.457-460.865

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Online since:

June 2004

Authors:

Fabrizio Roccaforte, Francesco La Via, A. Baeri, Vito Raineri, Lucia Calcagno, F. Mangano

Keywords:

Ni/Ti Bilayers, Schottky Diode, Silicide

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