Suppression Mechanism of Double Positioning Growth in 3C-SiC(111) Crystal by Using an Off-Axis Si(110) Substrate
Hetero-epitaxial CVD growth of 3C-SiC on a Si(110) substrate gives a (111) crystal with low defects density. However, double positioning growth often disturbs growth of a single crystal. The growth on an off-axis Si(110) substrate suppressed propagation of the double positioning defects in the grown layer effectively. Cross-sectional transmission electron microscopy revealed the details of the suppression process on the off-axis substrate. The suppression mechanism and the origin of the defects formation at double positioning boundaries were interpreted by the growth model based on an anisotropic growth rate on (111) plane of 3C-SiC.
Roberta Nipoti, Antonella Poggi and Andrea Scorzoni
M. Nakamura et al., "Suppression Mechanism of Double Positioning Growth in 3C-SiC(111) Crystal by Using an Off-Axis Si(110) Substrate", Materials Science Forum, Vols. 483-485, pp. 181-184, 2005