Comparative Study of Ohmic Contact Metallizations to Nanocrystalline Diamond Films

Abstract:

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Nanocrystalline diamond (NCD) films were deposited using plasma-enhanced chemical vapor deposition. The NCD films were Boron-doped for p-type conductivity, yielding sheet resistances from 6.17x1011 to 522.5 /. Four different metals were deposited as Ohmic contacts and investigated for contact resistance and thermal stability. Contact and film annealing was performed under different atmospheric conditions with variable N2 content.

Info:

Periodical:

Materials Science Forum (Volumes 645-648)

Edited by:

Anton J. Bauer, Peter Friedrichs, Michael Krieger, Gerhard Pensl, Roland Rupp and Thomas Seyller

Pages:

733-735

DOI:

10.4028/www.scientific.net/MSF.645-648.733

Citation:

M. J. Tadjer et al., "Comparative Study of Ohmic Contact Metallizations to Nanocrystalline Diamond Films", Materials Science Forum, Vols. 645-648, pp. 733-735, 2010

Online since:

April 2010

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Price:

$35.00

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