High-Performance Multi-Wafer SiC Epitaxy – First Results of Using a 10x100mm Reactor
In this paper, we present first results of epitaxial layer deposition using a novel warm-wall CVD multi-wafer system AIX 2800G4 WW from AIXTRON with a capability of processing 10x100mm wafers per run. Intra-wafer and wafer-to-wafer homogeneities of doping and thickness for full-loaded 10x100mm runs will be shown and compared to results of the 6x100mm setup of our hot-wall reactor VP2000HW by AIXTRON used for device production since 2001.
Anton J. Bauer, Peter Friedrichs, Michael Krieger, Gerhard Pensl, Roland Rupp and Thomas Seyller
C. Hecht et al., "High-Performance Multi-Wafer SiC Epitaxy – First Results of Using a 10x100mm Reactor", Materials Science Forum, Vols. 645-648, pp. 89-94, 2010