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Using Megasonics for Particle and Residue Removal in Single Wafer Cleaning
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Behaviour of a Well-Designed Megasonic Cleaning System
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Electrophoretic Studies on Silicon Nitride: Traces of Silicates in UPW Shift Zeta Potential Similar to SC-1
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HomeSolid State PhenomenaSolid State Phenomena Vols. 103-104Megasonics: A Cavitation Driven Process

Megasonics: A Cavitation Driven Process

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Ultra Clean Processing of Silicon Surfaces VII

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Periodical:

Solid State Phenomena (Volumes 103-104)

Pages:

159-162

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.103-104.159

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Online since:

April 2005

Authors:

Frank Holsteyns, Kuntack Lee, Sabine Graf, Roger Palmans, Guy Vereecke, Paul W. Mertens

Keywords:

Bubble, Cavitation, Gas, Megasonic Cleaning

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© 2005 Trans Tech Publications Ltd. All Rights Reserved

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[1] Holsteyns F. et al.: Proc. Eight Intern. Symp. Cleaning Tech. Electrochem. Soc. PV 2003-26, 161-167 (2004).

[2] Xu K. et al. : Solid state phenomena, 92, 161-164 (2003).

[3] Vereecke et al. : Proc. Eight Intern. Symp. Cleaning Tech. Electrochem. Society PV 2003-26, 145-152 (2004).

[4] Lofstedt R., et al.: Phys Fluids A 5, 11, 2911-2928 (1993).

[5] Busnaina A. et al.: J. Electrochem. Soc., 142, 2812-2817 (1995).

[6] Olim M.: J. Electrochem. Soc., 144, 3657-3659 (1997). Figure 6: Experimental setup: evaluation of SL and PRE (150nm SiO2) in UPW (Power: 10W/cm 2, time: 5min, flow 8SLM) for different levels of saturation for oxygen. Commercial tool A: evaluation of PRE (34nm SiO2) and damage (power: 100%, time: 5min, flow 8SLM) for different levels of saturation for nitrogen. Figure 7: Variation of PRE (78nm SiO2) in relation to the level of saturation of argon and nitrogen in commercial tool A. 0 20 40 60 80 100 0 1 2 3 4 5 0 20 40 60 80 100 PRE (%) - Damage sites (#) Sonoluminescence (a.u.) Level of saturation (%) Tool A, PRE Tool A, Damage Ex. Setup, Sonolum. Ex. Setup, PRE 0 10 20 30 40 50 60 70 0 28 83 104 Argon Nitrogen PRE (%) Level of saturation (%)

DOI: 10.7554/elife.37751.011