All-Wet Stripping of FEOL Photoresist Using Mixtures of Sulphuric Acid

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Periodical:

Solid State Phenomena (Volume 134)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

105-108

DOI:

10.4028/www.scientific.net/SSP.134.105

Citation:

E. Bellandi et al., "All-Wet Stripping of FEOL Photoresist Using Mixtures of Sulphuric Acid", Solid State Phenomena, Vol. 134, pp. 105-108, 2008

Online since:

November 2007

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$35.00

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