High Dose Implant Stripping and Residue Removal with Sequential Plasma and Vacuum Aerosol Processes

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Periodical:

Solid State Phenomena (Volume 134)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

117-120

DOI:

10.4028/www.scientific.net/SSP.134.117

Citation:

K. A. Reinhardt et al., "High Dose Implant Stripping and Residue Removal with Sequential Plasma and Vacuum Aerosol Processes", Solid State Phenomena, Vol. 134, pp. 117-120, 2008

Online since:

November 2007

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Price:

$35.00

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