II: Ultra-Shallow Junction Cleaning: Methodologies for Process and Chemistry Optimization

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Periodical:

Solid State Phenomena (Volume 134)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

133-137

Citation:

A. K. Srivastava et al., "II: Ultra-Shallow Junction Cleaning: Methodologies for Process and Chemistry Optimization ", Solid State Phenomena, Vol. 134, pp. 133-137, 2008

Online since:

November 2007

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[1] Ameen et al. Ultrashallow junction cleaning: methodologies for process and chemistry optimization, this conference, (2006).

[2] US patent number 6, 057, 645.

[3] Srivastava, et al. A New Plasma Source for Photoresist Ash and Residue Removal, 1998 IEEE Conference on Plasma Sciences at Raleigh, North Carolina, USA.

[4] US patent number 6, 761, 796.

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