Impact of RF Oxygen Plasma on Thermal Oxide Etch-Rate

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Periodical:

Solid State Phenomena (Volume 134)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

125-128

DOI:

10.4028/www.scientific.net/SSP.134.125

Citation:

E. Bellandi et al., "Impact of RF Oxygen Plasma on Thermal Oxide Etch-Rate", Solid State Phenomena, Vol. 134, pp. 125-128, 2008

Online since:

November 2007

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$35.00

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