Study of a Metal Gate and Silicon Selective “Dry Ash Only” Process for Combined Extension and Halo Implanted Photo Resist

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Periodical:

Solid State Phenomena (Volume 134)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

113-116

DOI:

10.4028/www.scientific.net/SSP.134.113

Citation:

G. Mannaert et al., "Study of a Metal Gate and Silicon Selective “Dry Ash Only” Process for Combined Extension and Halo Implanted Photo Resist", Solid State Phenomena, Vol. 134, pp. 113-116, 2008

Online since:

November 2007

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Price:

$35.00

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