Wafer Cleaning Using Supercritical CO2 in Semiconductor and Nanoelectronic Device Fabrication

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Periodical:

Solid State Phenomena (Volume 134)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

97-103

DOI:

10.4028/www.scientific.net/SSP.134.97

Citation:

K. Saga and T. Hattori, "Wafer Cleaning Using Supercritical CO2 in Semiconductor and Nanoelectronic Device Fabrication", Solid State Phenomena, Vol. 134, pp. 97-103, 2008

Online since:

November 2007

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$35.00

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