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Wafer Cleaning Using Supercritical CO₂ in Semiconductor and Nanoelectronic Device Fabrication

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Ultra Clean Processing of Semiconductor Surfaces VIII

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Periodical:

Solid State Phenomena (Volume 134)

Pages:

97-103

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.134.97

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Online since:

November 2007

Authors:

Koichiro Saga, Takeshi Hattori

Keywords:

NEMS, Photoresist Stripping, Silicon Dioxide-Etching, Supercritical CO₂

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© 2008 Trans Tech Publications Ltd. All Rights Reserved

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