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HomeSolid State PhenomenaSolid State Phenomena Vol. 134All Wet Stripping of Implanted Photoresist

All Wet Stripping of Implanted Photoresist

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Ultra Clean Processing of Semiconductor Surfaces VIII

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Periodical:

Solid State Phenomena (Volume 134)

Pages:

109-112

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.134.109

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Online since:

November 2007

Authors:

Kurt K. Christenson, Jeffery W. Butterbaugh, Thomas J. Wagener, Nam Pyo Lee, Brent Schwab, Michael Fussy, John Diedrick

Keywords:

Implanted Photoresist Stripping, Piranha, Wet Strip

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Сopyright:

© 2008 Trans Tech Publications Ltd. All Rights Reserved

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Citation:

[1] T. Bausum, M. DeSarno and G. Dahrooge, Semi. Intl., Web Exclusive, June (2003).

[2] S. Verhaverbeke and K. Christenson, in Contamination-Free Manufacturing for Semiconductors and Other Precision Products, ed. Robert P. Donovan, pp.320-322 (2001).

[3] R. Iler, "The Chemistry of Silica," Wiley-Interscience, New York, 1979, p.190.