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Ultra Clean Processing of Semiconductor Surfaces VIII

Solid State Phenomena Volume 134

• Papers
• Abstracts

• p3 Etching of Silicon Dioxide with Gas Phase HF and Water: Initiation, Bulk Etching, and Termination.   [ 2 M ]
  Authors: Gerardo Montaño-Miranda, Anthony Muscat
• p7 Evaluation of the Plasmaless Gaseous Etching Process   [ 474 K ]
  Authors: Yoshiya Hagimoto, Hajime Ugajin, Daisuke Miyakoshi, Hayato Iwamoto, Yusuke Muraki, Takehiko Orii
• p11 Single Wafer Hydrophobic Surface Preparation on 300mm by HF Vapor   [ 190 K ]
  Authors: Thierry Salvetat, Olivier Pollet, Pascal Besson, Névine Rochat
• p15 Insights into HF-Last Processes and Particle Performance in a Single Wafer Spin Cleaning Tool   [ 345 K ]
  Authors: Gim Chen, Ismail Kashkoush
• p19 Implementing an In Situ Surface Preparation Prior to Ni Deposition for Ni Salicide Processes   [ 261 K ]
  Authors: Kyuh Wan Chang, Scott Bolton, Marc Rossow, Rich Gregory, Jack Jiang, Dharmesh Jawarani, Stefan Zollner, Dean Denning, Jon Cheek
• p23 Electrical Impact of Various Arsenic-Residues Cleanings   [ 200 K ]
  Authors: Y.S. Tan, S.P. Chiew, Z. Yang, Zainab Ismail, Felicia Goh, Christopher Lim, Vincent Sih, Ee Ping Yu, Goh Boon Cheng
• p27 Elimination of Watermark on Extremely High-Doped Poly-Silicon Surfaces Using HF-Vapor Cleaning   [ 930 K ]
  Authors: Kang Heon Lee, John Ghekiere, Joon Bum Shim, Eric Bergman, Gyu Hyun Kim, Bai Kil Choi, Kee Joon Oh, Geun Min Choi
• p33 Passivation Studies of Germanium Surfaces   [ 465 K ]
  Authors: Jung Yup Kim, Jim McVittie, Krishna Saraswat, Yoshio Nishi
• p37 Germanium Surface Passivation Using Ozone Gaseous Phase   [ 190 K ]
  Authors: Virginie Loup, Pascal Besson, Olivier Pollet, Eugénie Martinez, Emmanuelle Richard, Sandrine Lhostis
• p41 Surface States and Recombination Loss on Wet-Chemically Passivated Si Studied by Surface Photovoltage (SPV) and Photoluminescence (PL)   [ 170 K ]
  Authors: H. Angermann, J. Rappich