[1]
J. Wan, et. al.: IEEE Electron Device Letters Vol. 23, (2002), p.482.
Google Scholar
[2]
T. Ohshima, et. al.: Japanese Journal of Applied Physics Vol. 42 (2003), p. L625.
Google Scholar
[3]
P. G. Neudeck, et. al.: IEEE Transactions on Electron Devices Vol. 41 (1994), p.826.
Google Scholar
[4]
P. G. Neudeck, et al.: Materials Science Forum Vol. 389-393 (2002), p.311.
Google Scholar
[5]
P. G. Neudeck, et al.: Materials Science Forum Vol. 433-436 (2002), p.213.
Google Scholar
[6]
P. G. Neudeck and J. A. Powell: Homoepitaxial and Heteroepitaxial Growth on Step-Free SiC Mesas, in Recent Major Advances in SiC (Springer-Verlag, Germany 2003), p.179.
DOI: 10.1007/978-3-642-18870-1_8
Google Scholar
[7]
A. J. Trunek, et. al.: Comparative Growth Behavior of 3C-SiC Mesa Heterofilms With and Without Extended Defects, presented at this conference, (2003).
DOI: 10.4028/www.scientific.net/msf.457-460.261
Google Scholar
[8]
M. Dudley, W. M. Vetter, and P. G. Neudeck: Journal of Crystal Growth Vol. 240 (2002), p.22.
Google Scholar
[9]
D. K. Schroder: Advanced MOS Devices (Addison-Wesley, Reading, MA 1987).
Google Scholar
[10]
Charles Evans & Associtates, Sunnyvale, CA, http: /www. cea. com.
Google Scholar
[11]
A. V. Los and M. S. Mazzola: Journal of Electronic Materials Vol. 30 (2001), p.235.
Google Scholar
[12]
B. J. Baliga: Modern Power Devices, 1st ed. (John Wiley & Sons, Inc., New York 1987), p.67.
Google Scholar
[13]
A. O. Konstantinov, et. al.: Applied Physics Letters Vol. 71 (1997), p.90.
Google Scholar
[14]
S. Nakamura, et. al.: Journal of Applied Physics Vol. 80 (2002), p.3355.
Google Scholar
[15]
C. W. Liu and J. C. Sturm: Journal of Applied Physics Vol. 82 (1997), p.4558.
Google Scholar
[16]
Y. Ishida, et. al.: Materials Science Forum Vol. 389-393 (2002), pp.459-1017 Breakdown Electric Field [MV/cm] Doping [1/cm3] Silicon.
Google Scholar
[12]
4H <0001>.
Google Scholar
[13]
4H <1120> & <0338>.
Google Scholar
[14]
0 1 2 3 4 5 1 1017 3 1017 5 1017 Breakdown Electric Field [MV/cm] Doping [1/cm3] Silicon.
Google Scholar
[12]
4H <0001>.
Google Scholar
[13]
4H <1120> & <0338>.
Google Scholar
[14]
3C on Silicon.
Google Scholar
[15]
3C p-type Schottky (this work) 3C pn diode.
Google Scholar
[3]
4H p-type Schottky (this work) 3C on Silicon.
Google Scholar
[15]
3C p-type Schottky (this work) 3C pn diode.
Google Scholar
[3]
4H p-type Schottky (this work) Fig. 6 Breakdown electric field vs. doping at 23°C.
Google Scholar