Reactive Ion Etching of Silicon Carbide with Patterned Boron Implantation

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Periodical:

Materials Science Forum (Volumes 457-460)

Edited by:

Roland Madar, Jean Camassel and Elisabeth Blanquet

Pages:

925-928

Citation:

K. Vassilevski et al., "Reactive Ion Etching of Silicon Carbide with Patterned Boron Implantation", Materials Science Forum, Vols. 457-460, pp. 925-928, 2004

Online since:

June 2004

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$38.00

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