Development of High Temperature Lateral HV and LV JFETs in 4H-SiC

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Abstract:

A series of high voltage (HV) and low voltage (LV) lateral JFETs are successfully developed in 4H-SiC based on the vertical channel LJFET (VC-LJFET) device platform. Both room temperature and 300 oC characterizations are presented. The HV JFET shows a specific-on resistance of 12.8 mΩ·cm2 and is capable of conducting current larger than 3 A at room temperature. A threshold voltage drop of about 0.5 V for HV and LV JFETs is observed when temperature varies from room temperature to 300 oC. The measured increase of specific-on resistance with temperature due to a reduction of electron mobility agrees with the numerical prediction. The first demonstration of SiC power integrated circuits (PIC) is also reported, which shows 5 MHz switching at VDS of 200 V and on-state current of 0.4 A.

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Materials Science Forum (Volumes 600-603)

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1091-1094

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September 2008

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© 2009 Trans Tech Publications Ltd. All Rights Reserved

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[1] K. Tone, J. H. Zhao, L. Fursin, P. Alexandrov, and M. Weiner, IEEE Electron Device Lett. Vol. 24 (2003), p.463.

DOI: 10.1109/led.2003.815000

Google Scholar

[2] N. Miura, K. Fujihira, Y. Nakao, T. Watanabe, Y. Tarui, S. Kinouchi, M. Imaizumi and T. Oomori, Proceedings of the 18th International Symposium on Power Semiconductor Devices & IC's, Jun. 4-8 (2006).

DOI: 10.1109/ispsd.2006.1666121

Google Scholar

[3] M. Noborio, J. Suda, and T. Kimoto, Proceedings of the 18th International Symposium on Power Semiconductor Devices & IC's, Jun. 4-8 (2006).

Google Scholar

[4] K. Fujikawa, K. Shibata, T. Masuda, S. Shikata, and H. Hayashi, IEEE Electron Device Lett. Vol. 25 (2004), p.790.

DOI: 10.1109/led.2004.838058

Google Scholar

[5] K. Sheng and S. Hu, IEEE Trans. Electron Devices Vol. 52 (2005), p.2300.

Google Scholar

[6] M. Su, K. Sheng, Y. Li, Y. Zhang, J. Wu, J. H. Zhao, J. Zhang, and L. X. Li, IEEE Electron Device Lett. Vol . 27 (2006), p.834.

Google Scholar

[7] Y. Zhang, K. Sheng, M. Su, J. H. Zhao, P. Alexandrov and L. Fursin, IEEE Electron Device Lett. Vol. 28 (2007), p.404.

Google Scholar

[8] J. A. Cooper, Jr., M. R. Melloch,R. Singh, A. Agarwal, and J. W. Palmour, IEEE Trans. Electron Devices Vol. 49 (2002), p.658.

DOI: 10.1109/16.992876

Google Scholar

[9] S.M. Sze, in: Physics of Semiconductor Devices, (2nd edition, John Wiley & Sons, Inc., USA 1981).

Google Scholar